The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2003
Filed:
Nov. 29, 1999
Applicant:
Inventors:
Gregor Morfill, München, DE;
Hubertus Thomas, Pfaffenhofen, DE;
Timo Stuffler, Seefeld, DE;
Uwe Konopka, Neufahrn, DE;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/02 ; H05H 1/24 ; H05H 1/46 ;
U.S. Cl.
CPC ...
H05H 1/02 ; H05H 1/24 ; H05H 1/46 ;
Abstract
In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a substrate surface. A device for manipulating of particles in plasma-cristalline state includes a reaction vessel, in which plasma electrodes and at least one substrate are situated. An adaptive electrode for formation of a location selective low frequency or static electrical field in the reaction vessel is described.