Tim H Lee

Title: Tim H Lee: Innovator in Air Gap Structures

Introduction

Tim H Lee is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of air gap structures. With a total of 2 patents, his work has advanced the understanding and implementation of dielectric layers in electronic devices.

Latest Patents

Tim H Lee's latest patents include innovative methods for forming air gap structures with dual dielectric layers. The first patent describes a method to create an air gap structure by forming an opening in a first dielectric layer between adjacent conductors. A first dielectric layer is then formed over the opening to fill a portion of it, while the remainder remains free of this layer. A second dielectric layer is placed on top of the first, leaving an unfilled portion that defines the air gap structure. This design allows for improved performance in electronic applications.

The second patent focuses on a structure that includes an air gap with a non-conformal dielectric layer over the opening. This layer may narrow the end portion of the air gap but does not necessarily seal it. In some instances, the non-conformal layer can seal the end portion and include a seam. Additionally, a conformal dielectric layer may be applied to enhance the sealing of the air gap structure, which is crucial for the reliability of electronic devices.

Career Highlights

Tim H Lee is currently employed at GlobalFoundries U.S. Inc., where he continues to innovate in the semiconductor industry. His work has been instrumental in developing technologies that enhance the efficiency and performance of electronic components.

Collaborations

Tim has collaborated with several talented individuals in his field, including Vincent James McGahay and Craig R Gruszecki. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Tim H Lee's contributions to the field of semiconductor technology, particularly through his patents on air gap structures, highlight his role as an influential inventor. His work at GlobalFoundries U.S. Inc. continues to shape the future of electronic devices.