Tianzhu Xu

Title: Innovations of Tianzhu Xu in Photothermal Measurement and Surface Defect Detection

Introduction

Tianzhu Xu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optical measurement technologies. With a total of 2 patents, his work focuses on enhancing measurement sensitivity and stability in various applications.

Latest Patents

One of his latest patents is the "Single-beam photothermal measurement apparatus and measurement method for absorptive defects." This invention features a common-path-type structure and a non-common-path-type structure. The apparatus is designed with a simple optical structure, making it convenient for alignment and adjustment. It effectively avoids measurement signal anomalies caused by environmental vibrations and sample tilts. By detecting power changes on the edge of a beam spot, the measurement sensitivity of the system is significantly improved.

Another notable patent is the "Surface defect measuring apparatus and method by microscopic scattering polarization imaging." This apparatus includes a laser, multiple converging lenses, a diaphragm, a polarizer, and a micro-polarizer array, among other components. It enables real-time microscopic scattering polarization imaging of surface defects. The invention enhances sensitivity for detecting surface defects on ultra-smooth elements and meets the requirements for rapid detection of surface defects on large-aperture ultra-smooth elements.

Career Highlights

Tianzhu Xu has worked with esteemed organizations such as the Chinese Academy of Sciences and Shanghai Hengyi Optics and Fine Mechanics Co., Ltd. His experience in these institutions has contributed to his expertise in optical measurement technologies.

Collaborations

Throughout his career, Tianzhu has collaborated with notable colleagues, including Shijie Liu and Kaizao Ni. These collaborations have further enriched his research and development efforts.

Conclusion

Tianzhu Xu's innovative patents in photothermal measurement and surface defect detection demonstrate his commitment to advancing optical measurement technologies. His contributions are significant in enhancing measurement sensitivity and stability, paving the way for future advancements in the field.