The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2024

Filed:

Dec. 30, 2021
Applicants:

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;

Shanghai Hengyi Optics and Fine Mechanics Co., Ltd., Shanghai, CN;

Inventors:

Shijie Liu, Shanghai, CN;

Kaizao Ni, Shanghai, CN;

Jianda Shao, Shanghai, CN;

Weiwei Wang, Shanghai, CN;

Tianzhu Xu, Shanghai, CN;

Yingjia Li, Shanghai, CN;

Qi Lu, Shanghai, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/31 (2006.01); G01N 21/958 (2006.01); G02B 26/10 (2006.01); G02B 27/14 (2006.01); G02B 27/28 (2006.01);
U.S. Cl.
CPC ...
G01N 21/31 (2013.01); G01N 21/958 (2013.01); G02B 26/105 (2013.01); G02B 27/14 (2013.01); G02B 27/283 (2013.01); G02B 27/286 (2013.01); G01N 2201/06113 (2013.01); G01N 2201/0636 (2013.01);
Abstract

A single-beam photothermal measurement apparatus and a measurement method for absorptive defects. The apparatus comprises a common-path-type structure and a non-common-path-type structure. The present invention is simple in optical structure and convenient to align and adjustment. The measurement result is stable, and measurement signal anomalies caused by environmental vibration and sample tilt are avoided. By detecting a power change on the edge of a beam spot, the measurement sensitivity of a system is remarkably improved.


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