Chinese Academy of Sciences

Shanghai Hengyi Optics and Fine Mechanics Co., Ltd

Tianzhu Xu

Qi Lu

Shijie Liu

Jianda Shao

Weiwei Wang

Kaizao Ni

Shenghao Wang

Yingjia Li

You Zhou

A single-beam photothermal measurement apparatus and a measurement method for absorptive defects. The apparatus comprises a common-path-type structure and a non-common-path-type structure. The present invention is simple in optical structure and convenient to align and adjustment. The measurement result is stable, and measurement signal anomalies caused by environmental vibration and sample tilt are avoided. By detecting a power change on the edge of a beam spot, the measurement sensitivity of a system is remarkably improved.

Single-beam photothermal measurement apparatus and measurement method for absorptive defects

A surface defect measuring apparatus and method by microscopic scattering polarization imaging is provided. The apparatus mainly comprises a laser, a first converging lens, a rotary diffuser, a second converging lens, a diaphragm, a third converging lens, a pinhole, a fourth converging lens, a polarizer, a half-wave plate, a polarizing beam splitter, an X-Y translation stage, a sample, a microscope lens, a quarter-wave plate, a micro-polarizer array, a camera and a computer. The micro-polarizer array is adopted to realize real-time microscopic scattering polarization imaging of the surface defects; a polarization-degree image is calculated to improve the sensitivity for detecting the surface defects of the ultra-smooth element, and the effective detection of the surface defects of a high-reflective coating element is also realized, and the requirement for rapid detection of the surface defects of a meter-scale large-aperture ultra-smooth element can be met.

Surface defect measuring apparatus and method by microscopic scattering polarization imaging

Growing community of inventors

Shanghai, China

Tianzhu Xu