The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Sep. 29, 2020
Applicant:

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Jianda Shao, Shanghai, CN;

Shijie Liu, Shanghai, CN;

Kaizao Ni, Shanghai, CN;

Shenghao Wang, Shanghai, CN;

You Zhou, Shanghai, CN;

Weiwei Wang, Shanghai, CN;

Tianzhu Xu, Shanghai, CN;

Qi Lu, Shanghai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01N 21/49 (2006.01); G01N 21/88 (2006.01); G02B 21/08 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/21 (2013.01); G01N 21/49 (2013.01); G01N 21/8806 (2013.01); G02B 21/0032 (2013.01); G02B 21/0036 (2013.01); G02B 21/0068 (2013.01); G02B 21/082 (2013.01); G01N 2021/8848 (2013.01); G01N 2201/0683 (2013.01); G01N 2201/06113 (2013.01);
Abstract

A surface defect measuring apparatus and method by microscopic scattering polarization imaging is provided. The apparatus mainly comprises a laser, a first converging lens, a rotary diffuser, a second converging lens, a diaphragm, a third converging lens, a pinhole, a fourth converging lens, a polarizer, a half-wave plate, a polarizing beam splitter, an X-Y translation stage, a sample, a microscope lens, a quarter-wave plate, a micro-polarizer array, a camera and a computer. The micro-polarizer array is adopted to realize real-time microscopic scattering polarization imaging of the surface defects; a polarization-degree image is calculated to improve the sensitivity for detecting the surface defects of the ultra-smooth element, and the effective detection of the surface defects of a high-reflective coating element is also realized, and the requirement for rapid detection of the surface defects of a meter-scale large-aperture ultra-smooth element can be met.


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