Shanghai, China

You Zhou

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Chinese Academy of Sciences. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: You Zhou. Retrieved from https://idiyas.com/inventor/you-zhou-gxit64tr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of You Zhou in Surface Defect Measurement

Introduction

You Zhou is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of surface defect measurement through his innovative patent. His work focuses on enhancing the sensitivity and efficiency of detecting surface defects in ultra-smooth elements.

Latest Patents

You Zhou holds a patent for a "Surface defect measuring apparatus and method by microscopic scattering polarization imaging." This apparatus comprises various components, including a laser, multiple converging lenses, a rotary diffuser, and a micro-polarizer array. The technology enables real-time microscopic scattering polarization imaging of surface defects, improving detection sensitivity for high-reflective coating elements. The invention meets the requirements for rapid detection of surface defects in large-aperture ultra-smooth elements.

Career Highlights

You Zhou is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced measurement techniques. His innovative approach has positioned him as a key figure in the field of optical measurement.

Collaborations

You Zhou has collaborated with notable colleagues, including Shijie Liu and Jianda Shao, to further advance the research in surface defect measurement technologies.

Conclusion

You Zhou's contributions to the field of surface defect measurement through his innovative patent demonstrate his commitment to advancing technology in this area. His work continues to influence the industry and improve measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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