This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Huali Integrated Circuit Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Innovations of Tianchen Kang in Integrated Circuit Technology
Introduction
Tianchen Kang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of integrated circuit technology. His innovative approach has led to the development of a unique method that addresses challenges in residue formation after mandrel removal.
Latest Patents
Tianchen Kang holds 1 patent for his invention titled "Method for improving residue formation after mandrel removal." This patent outlines a comprehensive process that includes several steps: providing a TEOS layer, forming mandrel structures spaced apart on the TEOS layer, and creating spacers on the sidewalls of each mandrel structure. The method further involves forming a first SOC layer to cover the TEOS layer and mandrel structures, followed by the formation of a SOC structure that covers the spacers while exposing the top surfaces of the mandrel structures. The process concludes with the removal of the mandrel structures and top planarization of the second SOC layer.
Career Highlights
Tianchen Kang is currently employed at Shanghai Huali Integrated Circuit Corporation. His work at this esteemed company has allowed him to focus on advancing integrated circuit technologies. His innovative methods have the potential to enhance manufacturing processes in the semiconductor industry.
Collaborations
Tianchen collaborates with talented professionals in his field, including Liyuan Liu and Pengkai Xu. Their combined expertise contributes to the advancement of integrated circuit technologies and fosters a collaborative environment for innovation.
Conclusion
Tianchen Kang's contributions to integrated circuit technology through his innovative patent demonstrate his commitment to improving manufacturing processes. His work continues to influence the industry positively.