Company Filing History:
Years Active: 2010
Title: Thorsten Schneppensieper: Innovator in Silicon Wafer Technology
Introduction
Thorsten Schneppensieper is a notable inventor based in Emmerting, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the development of epitaxially coated silicon wafers. His innovative approach has led to advancements that are crucial for various applications in electronics.
Latest Patents
Thorsten holds a patent for an "Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafer." This patent describes a method where silicon wafers are coated individually in an epitaxy reactor. The process involves placing a wafer on a susceptor, pretreating it under a hydrogen atmosphere, and then applying an etching medium. The epitaxial coating is performed on a polished front side, ensuring that the silicon wafers produced have a maximum local flatness value of SFQR of 0.01 µm to 0.035 µm relative to at least 99% of the partial regions of an area grid of measurement windows.
Career Highlights
Thorsten is currently associated with Siltronic AG, a leading company in the production of silicon wafers. His work at Siltronic AG has been instrumental in enhancing the quality and efficiency of silicon wafer production. His expertise in epitaxial processes has positioned him as a key figure in the semiconductor industry.
Collaborations
Thorsten collaborates with Reinhard Schauer, a fellow innovator in the field. Their partnership has fostered advancements in silicon wafer technology, contributing to the overall progress in semiconductor manufacturing.
Conclusion
Thorsten Schneppensieper's contributions to the field of silicon wafer technology exemplify the impact of innovation in the semiconductor industry. His patent and work at Siltronic AG highlight the importance of continuous development in this critical area of technology.