Thomas Tatry

Title: Thomas Tatry: Innovator in Hard Mask Layer Technology

Introduction

Thomas Tatry is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of hard mask layer stacks. His innovative work has led to the development of a unique patent that enhances the patterning process in semiconductor manufacturing.

Latest Patents

Tatry holds a patent for a hard mask layer stack and a method of patterning. This patent describes a hard mask layer stack that includes a carbon layer on top of the layer to be patterned, a first layer made from materials such as SiO and SiON, and a silicon layer on top of the first layer. The method involves providing this hard mask layer stack on the layer to be patterned and subsequently patterning the silicon hard mask layer according to a specific design.

Career Highlights

Thomas Tatry is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry. With 1 patent to his name, Tatry has established himself as a key player in the field of semiconductor technology.

Collaborations

Throughout his career, Tatry has collaborated with talented professionals such as Dirk Manger and Hocine Boubekeur. These collaborations have fostered an environment of innovation and creativity, further enhancing the development of new technologies.

Conclusion

In summary, Thomas Tatry is a distinguished inventor whose work in hard mask layer technology has made a significant impact in the semiconductor industry. His innovative patent and contributions at Infineon Technologies AG highlight his role as a leading figure in this field.