Location History:
- Stoke-On-Trent, GB (2011 - 2012)
- Alsager, GB (2014)
Company Filing History:
Years Active: 2011-2014
Title: Thomas Leese: Innovator in Atomic Layer Deposition
Introduction
Thomas Leese is a prominent inventor based in Stoke-on-Trent, GB. He has made significant contributions to the field of atomic layer deposition, particularly through his innovative methods involving titanium-based precursors. With a total of 3 patents to his name, Leese continues to push the boundaries of technology in his area of expertise.
Latest Patents
Leese's latest patents focus on methods of atomic layer deposition using titanium-based precursors. These methods involve delivering at least one precursor to a substrate, wherein the precursor corresponds in structure to a specific formula. This innovative approach allows for the formation of titanium-containing films, which have various applications in the industry.
Career Highlights
Throughout his career, Thomas Leese has been associated with Sigma-Aldrich Co. LLC, where he has further developed his expertise in atomic layer deposition. His work has not only advanced the technology but has also contributed to the company's reputation as a leader in the field.
Collaborations
Leese has collaborated with notable colleagues, including Peter Nicholas Heys and Andrew Kingsley. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Thomas Leese is a key figure in the field of atomic layer deposition, with a focus on titanium-based precursors. His contributions through patents and collaborations highlight his commitment to advancing technology in this specialized area.