The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Sep. 10, 2008
Peter Nicholas Heys, Crewe, GB;
Andrew Kingsley, Chester, GB;
Fuquan Song, Wirral, GB;
Paul Williams, Merseyside, GB;
Thomas Leese, Stoke-On-Trent, GB;
Hywel Owen Davies, Mold, GB;
Rajesh Odedra, Altrincham, GB;
Peter Nicholas Heys, Crewe, GB;
Andrew Kingsley, Chester, GB;
Fuquan Song, Wirral, GB;
Paul Williams, Merseyside, GB;
Thomas Leese, Stoke-On-Trent, GB;
Hywel Owen Davies, Mold, GB;
Rajesh Odedra, Altrincham, GB;
Sigma-Aldrich Co. LLC, St. Louis, MO (US);
Abstract
Methods of forming a metal-containing film by atomic layer deposition is provided. The methods comprise delivering at least one precursor to a substrate, wherein the at least one precursor corresponds in structure to Formula II: wherein: M is Hf or Zr; R is C-C-alkyl; n is zero, 1, 2, 3, 4 or 5; L is C-C-alkoxy. Further methods are provided of forming a metal-containing film by liquid injection atomic layer deposition. The methods comprise delivering at least one precursor to a substrate, wherein the at least one precursor corresponds in structure to Formula III: wherein: M is Hf or Zr; R is C-C-alkyl; n is zero, 1, 2, 3, 4 or 5; L is amino, wherein the amino is optionally independently substituted 1 or 2 times with C-C-alkyl.