Location History:
- Wirral, GB (2011 - 2012)
- Eastham, GB (2013 - 2014)
Company Filing History:
Years Active: 2011-2014
Title: Fuquan Song: Innovator in Atomic Layer Deposition Technologies
Introduction
Fuquan Song is a notable inventor based in Wirral, GB. He has made significant contributions to the field of atomic layer deposition (ALD) technologies. With a total of 4 patents to his name, his work focuses on advancing methods for forming titanium-containing films and utilizing hafnium and zirconium precursors.
Latest Patents
Fuquan Song's latest patents include innovative methods of atomic layer deposition using titanium-based precursors. These methods involve delivering at least one precursor to a substrate, which corresponds in structure to a specific formula. Additionally, he has developed precursors suitable for chemical vapor deposition, particularly for ALD of hafnium oxide or zirconium oxide. These precursors have a general formula that incorporates cyclopentadienyl ligands and various substituents.
Career Highlights
Fuquan Song is currently employed at Sigma-Aldrich Co. LLC, where he continues to push the boundaries of research in material science. His work has been instrumental in enhancing the efficiency and effectiveness of ALD processes, which are critical in various applications, including semiconductor manufacturing.
Collaborations
Some of his notable coworkers include Peter Nicholas Heys and Paul Williams. Their collaborative efforts have contributed to the advancement of technologies in the field of atomic layer deposition.
Conclusion
Fuquan Song's innovative work in atomic layer deposition has established him as a key figure in the field. His contributions continue to influence advancements in material science and technology.