Clifton Park, NY, United States of America

Thomas Laursen

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Laursen. Retrieved from https://idiyas.com/inventor/thomas-laursen-jl2gd11i

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Thomas Laursen - Innovating Lithographic Apparatus in Clifton Park, NY

Introduction:

Thomas Laursen, a talented inventor based in Clifton Park, NY, has made significant contributions to the field of lithography with his groundbreaking patent.

Latest Patents:

With a total of 1 patent under his belt, Thomas Laursen has developed a lithographic apparatus that incorporates a reflector designed to reflect radiation for cleaning the underside of a liquid supply system.

Career Highlights:

Thomas Laursen's expertise shines through his work at ASML Netherlands B.V., a leading company in the industry. His commitment to innovation and attention to detail have led to the creation of cutting-edge technology that pushes the boundaries of lithography.

Collaborations:

Throughout his career, Thomas Laursen has collaborated closely with esteemed colleagues such as Martinus Hendrikus Antonius Leenders and Youri Johannes Laurentius Maria Van Dommelen. Together, they have brought new ideas to life and advanced the field of lithography.

Conclusion:

In conclusion, Thomas Laursen stands out as a driven inventor with a passion for pushing the boundaries of technology. His contributions to the field of lithography have not gone unnoticed, and his patent serves as a testament to his ingenuity and dedication.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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