The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9019466 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 28, 2015

Filed:

Sep. 27, 2007
Applicants:

Martinus Hendrikus Antonius Leenders, Rhoon, NL;

Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);

Hans Jansen, Eindhoven, NL;

Robert Douglas Watso, Delevan, NY (US);

Anthonius Martinus Cornelis Petrus DE Jong, Pijnacker, NL;

Jan Willem Cromwijk, Best, NL;

Thomas Laursen, Clifton Park, NY (US);

Inventors:

Martinus Hendrikus Antonius Leenders, Rhoon, NL;

Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);

Hans Jansen, Eindhoven, NL;

Robert Douglas Watso, Delevan, NY (US);

Anthonius Martinus Cornelis Petrus De Jong, Pijnacker, NL;

Jan Willem Cromwijk, Best, NL;

Thomas Laursen, Clifton Park, NY (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); G03F 7/2041 (2013.01); G03F 7/70341 (2013.01);
Abstract

A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.


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