Thomas Christopher Hoff

Title: The Innovations of Thomas Christopher Hoff

Introduction

Thomas Christopher Hoff is an accomplished inventor based in Hillsboro, Oregon. He is known for his significant contributions to the field of integrated circuit (IC) devices. With a focus on advanced patterning techniques, Hoff has made strides in enhancing the capabilities of semiconductor technology.

Latest Patents

Hoff holds a patent titled "Directed self-assembly enabled patterning over metal layers using assisting features." This patent describes IC devices that include patterned conductive layers, such as metal gratings and gate layers. The innovation involves a directed self-assembly (DSA)-enabled process that utilizes DSA assisting features to create patterned layers over non-uniform features. This advancement allows for the formation of layers with different hard mask materials that replicate the structure of the conductive layer below, even when faced with varying features.

Career Highlights

Hoff is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has positioned him at the forefront of research and development in the field of integrated circuits. Hoff's expertise in directed self-assembly processes has contributed to the advancement of IC technology.

Collaborations

Throughout his career, Hoff has collaborated with notable colleagues, including Gurpreet Singh and Nityan Labros Nair. These collaborations have fostered a productive environment for innovation and have led to significant advancements in semiconductor technology.

Conclusion

Thomas Christopher Hoff's contributions to the field of integrated circuits through his innovative patent and work at Intel Corporation highlight his role as a key figure in semiconductor advancements. His dedication to improving patterning techniques continues to influence the industry.