Thomas Altmann

Title: Innovations of Thomas Altmann in Semiconductor Technology

Introduction

Thomas Altmann is a notable inventor based in Haiming, Germany, recognized for his contributions to the field of semiconductor technology. With a total of eight patents to his name, Altmann has made significant advancements in the production of high-purity polycrystalline silicon and semiconductor wafers.

Latest Patents

Among his latest patents is a method and device for producing high purity polycrystalline silicon with a reduced dopant content. This innovative process involves the use of a U-shaped silicon carrier body in a hermetically sealed deposition reactor, where silicon is deposited from a reaction gas. The method ensures that the diameter of the polysilicon rod increases while efficiently removing waste gas. Another significant patent is for an epitaxially coated semiconductor wafer and the process for producing it. This patent details a semiconductor wafer with a precisely controlled epitaxial layer, emphasizing the importance of surface flatness and roughness in achieving high-quality semiconductor materials.

Career Highlights

Throughout his career, Thomas Altmann has worked with prominent companies in the semiconductor industry, including Siltronic AG and Wacker Siltronic Gesellschaft für Halbleiter Materialien AG. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Altmann has collaborated with notable colleagues such as Guido Wenski and Gerhard Heier, further enhancing his work in the field.

Conclusion

Thomas Altmann's contributions to semiconductor technology through his patents and career achievements highlight his role as a significant innovator in the industry. His work continues to influence advancements in high-purity silicon production and semiconductor wafer quality.