Company Filing History:
Years Active: 2015-2021
Title: Thian Choi Lim: Innovator in Film Stack Technology
Introduction
Thian Choi Lim is a prominent inventor based in Singapore, known for her contributions to the field of semiconductor technology. With a focus on methods that enhance the efficiency and quality of film stack formation, she has secured a total of 2 patents that reflect her innovative spirit and technical expertise.
Latest Patents
One of her latest patents is titled "Method of forming film stacks with reduced defects." This method involves positioning a substrate on a substrate support within a processing chamber and sequentially depositing polysilicon layers and silicon oxide layers to produce the film stack. The process includes supplying a current of greater than 5 ampere to a plasma profile modulator while generating a deposition plasma, exposing the substrate to this plasma, and maintaining the processing chamber at a pressure between 2 Torr and 100 Torr during the deposition.
Another significant patent is "Adaptively tracking spectrum features for endpoint detection." This method controls polishing by detecting the exposure of a first layer beneath a second layer on a substrate. It utilizes an in-situ monitoring system to identify spectral features and characteristics during polishing, ensuring precision in halting the process at the right moment.
Career Highlights
Thian Choi Lim is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work focuses on developing advanced technologies that improve manufacturing processes and product quality.
Collaborations
Throughout her career, Thian has collaborated with notable colleagues, including Jeffrey Drue David and Harry Q Lee. These partnerships have contributed to her innovative projects and the successful development of her patents.
Conclusion
Thian Choi Lim's work exemplifies the intersection of innovation and technology in the semiconductor industry. Her patents not only advance the field but also demonstrate her commitment to excellence in engineering and invention.