Itami, Japan

Tetsuya Uchida

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuya Uchida. Retrieved from https://idiyas.com/inventor/tetsuya-uchida-antk8bzj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 1994

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tetsuya Uchida: Innovator in Semiconductor Technology

Introduction

Tetsuya Uchida is a prominent inventor based in Itami, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for predicting semiconductor workpiece topography.

Latest Patents

Uchida holds a patent for a "Semiconductor workpiece topography prediction method." This method involves predicting the topography of a semiconductor workpiece after various manufacturing processes, such as etching and film deposition. The process includes establishing a desired topography, specifying conditions for each manufacturing step, and using a modified diffusion model equation to predict material and virtual particle concentrations throughout the processes. He has 1 patent to his name.

Career Highlights

Uchida is associated with Mitsubishi Electric Corporation, where he applies his expertise in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and accuracy of semiconductor production processes.

Collaborations

Uchida collaborates with Masato Fujinaga, a fellow innovator in the field. Their partnership has contributed to advancements in semiconductor technology and manufacturing techniques.

Conclusion

Tetsuya Uchida's innovative work in semiconductor technology showcases his dedication to advancing the industry. His contributions, particularly in topography prediction methods, highlight the importance of precision in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…