Tokyo, Japan

Tetsuo Kawanabe

This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Hitachi High-Tech Corporation, Hitachi-High-Technologies Corporation. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuo Kawanabe. Retrieved from https://idiyas.com/inventor/tetsuo-kawanabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019-2026

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Tetsuo Kawanabe - Pioneer in Plasma Processing Technology

Introduction:

Tetsuo Kawanabe, a renowned inventor hailing from Tokyo, Japan, has made significant contributions to the field of plasma processing technology. With a notable patent under his belt, his expertise and innovation have propelled the industry forward.

Latest Patents:

One of Kawanabe's notable inventions is the "Plasma Processing Apparatus," a sophisticated system designed to facilitate plasma processing in a vacuum vessel. This apparatus features cutting-edge components such as gas suppliers, electromagnetic wave suppliers, and high-frequency power sources, enabling the efficient generation of plasma for wafer processing.

Career Highlights:

Kawanabe's professional journey has been closely tied to his role at Hitachi High Technologies Corporation, a leading organization in the realm of high-precision technology solutions. Within the company, he has spearheaded projects, leveraging his expertise in plasma processing to drive innovation and technological advancement.

Collaborations:

Throughout his career, Kawanabe has collaborated with esteemed colleagues such as Takumi Tandou and Tsutomu Tetsuka. Together, they have tackled complex challenges in the field, combining their unique skill sets to push the boundaries of plasma processing technology and enhance its applications in various industries.

Conclusion:

In conclusion, Tetsuo Kawanabe stands as a prominent figure in the realm of plasma processing technology, with a remarkable patent and a track record of innovation. His contributions have not only enhanced the efficiency of wafer processing but have also paved the way for further advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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