Tetsujiro Yoshiharu

Title: Tetsujiro Yoshiharu: Innovator in Semiconductor Technology

Introduction

Tetsujiro Yoshiharu is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to manufacturing processes.

Latest Patents

Yoshiharu's latest patents include a semiconductor wafer and a manufacturing method therefor. This invention involves a semiconductor wafer on which silicon is epitaxially grown. It features p-type or n-type impurities that are doped, along with a blocking film on the rear surface, which prevents the jumping out of impurities that can cause auto-doping. This innovation effectively prevents the production of silicon particles at the peripheral surface, thereby reducing contamination during semiconductor device manufacturing. Another patent focuses on the epitaxial growth on the semiconductor wafer, emphasizing similar features to enhance the manufacturing process.

Career Highlights

Throughout his career, Tetsujiro Yoshiharu has worked with prominent companies such as Osaka Titanium Co., Ltd. and Kyushu Electronic Metal Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Yoshiharu has collaborated with various professionals in his field, including his coworker Haruo Kamise. These collaborations have likely enriched his work and led to advancements in semiconductor manufacturing techniques.

Conclusion

Tetsujiro Yoshiharu stands out as an influential inventor in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and reducing contamination in semiconductor devices. His contributions continue to impact the field positively.