Company Filing History:
Years Active: 2013-2023
Title: Tetsuhiro Ohno: Innovator in Film Formation Technology
Introduction
Tetsuhiro Ohno is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of film formation technology, holding a total of 6 patents. His work focuses on developing advanced apparatuses that enhance the efficiency and precision of film deposition processes.
Latest Patents
One of Tetsuhiro Ohno's latest patents is a film formation apparatus designed to perform deposition on a substrate. This innovative apparatus includes a supply device located within an evacuable vacuum chamber, which supplies the deposition material. Additionally, it features a holding device that secures the substrate during the deposition process. The holding device is equipped with a deposition preventing plate that protects specific areas of the substrate from unwanted material adherence. Another notable patent involves a substrate guide and carrier system that supports a substrate in a substantially vertical position. This system ensures that the substrate is held securely while allowing for precise contact with its peripheral edge.
Career Highlights
Tetsuhiro Ohno has established himself as a key figure in the field of film formation technology through his work at Ulvac, Inc. His innovative designs and patents have contributed to advancements in the manufacturing processes of various industries.
Collaborations
Throughout his career, Tetsuhiro has collaborated with notable colleagues, including Toshinori Kaneko and Tsuyoshi Yoshimoto. These collaborations have further enriched his work and led to the development of cutting-edge technologies in film formation.
Conclusion
Tetsuhiro Ohno's contributions to film formation technology exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to influence the industry, showcasing the importance of his work in advancing manufacturing processes.