The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Apr. 20, 2020
Applicant:

Ulvac, Inc., Chigasaki, JP;

Inventors:

Ken Maehira, Chigasaki, JP;

Koh Fuwa, Chigasaki, JP;

Tomoko Kittaka, Chigasaki, JP;

Tetsuhiro Ohno, Chigasaki, JP;

Hirotoshi Sakaue, Chigasaki, JP;

Assignee:

ULV AC, INC., Chigasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/50 (2006.01); C23C 14/34 (2006.01); H02N 13/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/505 (2013.01); C23C 14/34 (2013.01); H01J 37/32724 (2013.01); H02N 13/00 (2013.01);
Abstract

A first voltage is applied to a first positive electrode and a first negative electrode of an attraction plate in a lying posture to attract a dielectric object to be attracted on the attraction plate. The attraction plate is turned to a stand posture while attracting the dielectric object by a gradient force, and a conductive thin film is grown while applying a second voltage to a second positive electrode and a second negative electrode to generate an electrostatic force. Since the object is continuously attracted, the attraction plate will not detach. After having started attraction by electrostatic force, introduction of heat medium gas between the object and the attraction plate allows for temperature control of the object.


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