Kanagawa, Japan

Teruhisa Matsumaru

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2018-2022

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4 patents (USPTO):Explore Patents

Title: Teruhisa Matsumaru: Innovator in Polyimide Technology

Introduction

Teruhisa Matsumaru is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of polyimide technology, holding a total of 4 patents. His work focuses on methods for controlling polyimide backbone structures and producing high-quality polyimide resins and films.

Latest Patents

Matsumaru's latest patents include a method for controlling a polyimide backbone structure. This method involves the preparation of a polyimide through the reaction of a diamine component and (1S,2R,4S,5R)-cyclohexanetetracarboxylic dianhydride in an organic solvent. The process allows for the adjustment of various reaction conditions to convert a cis-structure to a trans-structure, thereby controlling the proportion of the trans-structure in the formed polyimide. Another notable patent is for a polyimide resin and film that exhibit excellent transparency and a low coefficient of linear thermal expansion. These innovations are crucial for applications requiring high-performance materials.

Career Highlights

Teruhisa Matsumaru is currently employed at Mitsubishi Gas Chemical Company, Inc. His work at this esteemed company has allowed him to develop advanced materials that are essential in various industries. His expertise in polyimide technology has positioned him as a key figure in the field.

Collaborations

Matsumaru has collaborated with notable coworkers such as Shuya Suenaga and Yohei Abiko. These partnerships have fostered an environment of innovation and have contributed to the advancement of polyimide technology.

Conclusion

Teruhisa Matsumaru's contributions to polyimide technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the materials science field significantly.

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