Teruhisa Komuro

Title: Teruhisa Komuro: Innovator in Vapor Deposition Technology

Introduction

Teruhisa Komuro is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of vapor deposition technology, holding 2 patents that showcase his innovative approaches to film formation on substrates. His work is instrumental in advancing the capabilities of manufacturing processes in various industries.

Latest Patents

Komuro's latest patents include a method for forming a laminated film on a substrate and a transparent vapor-deposited film. The method for forming a laminated film involves a continuous vapor deposition process that includes several steps, such as plasma pretreatment of the substrate and the application of a voltage to enhance film adhesion. The transparent vapor-deposited film utilizes a roller-type continuous vapor-deposited film forming device, which allows for high-speed production of an inorganic oxide vapor-deposited film, primarily composed of aluminum oxide. This innovative approach results in a highly adhesive and transparent film that meets the demands of modern applications.

Career Highlights

Teruhisa Komuro is associated with Dai Nippon Printing Co., Ltd., where he has been able to apply his expertise in vapor deposition technology. His work has not only contributed to the company's advancements but has also positioned him as a key figure in the field of material science.

Collaborations

Throughout his career, Komuro has collaborated with notable colleagues, including Tatsuo Asuma and Shigeki Matsui. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the industry.

Conclusion

Teruhisa Komuro's contributions to vapor deposition technology exemplify the spirit of innovation in the field. His patents and collaborative efforts continue to influence advancements in manufacturing processes, making him a significant figure in the realm of inventions.