Dai Nippon Printing Co., Ltd.

Teruhisa Komuro

Shigeki Matsui

Tatsuo Asuma

Hiroshi Matsuzaki

Hiroshi Miyama

Takakazu Goto

Kaoru Miyazaki

A method for forming a film on a substrate by continuous vapor deposition includes: introducing the substrate into a film-forming apparatus; conveying the substrate into a pretreatment compartment of a pressure reduction chamber of the film-forming apparatus; performing plasma pretreatment of the substrate including supplying a plasma source gas composed of argon and at least one of oxygen, nitrogen, carbon dioxide gas and ethylene, introducing the plasma source gas that has been supplied as plasma into a gap between a magnet of the pretreatment compartment and a pretreatment roller such that the plasma is entrapped in the gap, and holding the plasma and applying a voltage between the pretreatment roller and a plasma-supply nozzle; conveying the substrate into a vapor deposition compartment of the pressure reduction chamber; and forming the film by vapor deposition on a surface of the substrate which has been pretreated.

Method for forming a laminated film on a substrate

Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet (), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film.

Transparent vapor-deposited film

Growing community of inventors

Tokyo, Japan

Teruhisa Komuro