The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2017

Filed:

Sep. 26, 2013
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Shigeki Matsui, Tokyo, JP;

Tatsuo Asuma, Tokyo, JP;

Teruhisa Komuro, Tokyo, JP;

Hiroshi Miyama, Tokyo, JP;

Takakazu Goto, Tokyo, JP;

Kaoru Miyazaki, Tokyo, JP;

Hiroshi Matsuzaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 (2006.01); C23C 14/08 (2006.01); C23C 14/02 (2006.01); C23C 14/56 (2006.01); B32B 7/12 (2006.01);
U.S. Cl.
CPC ...
C23C 14/081 (2013.01); B32B 7/12 (2013.01); C23C 14/021 (2013.01); C23C 14/562 (2013.01); B32B 2255/20 (2013.01); B32B 2307/31 (2013.01); B32B 2307/412 (2013.01); B32B 2307/7242 (2013.01); B32B 2439/00 (2013.01); Y10T 428/24843 (2015.01); Y10T 428/265 (2015.01); Y10T 428/2826 (2015.01);
Abstract

Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet (), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film.


Find Patent Forward Citations

Loading…