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For the Inventor, By the Inventor

Fukushima, Japan

Teruaki Fukami

This inventor holds 10 USPTO granted patents. Top assignee: Shin-Etsu Handotai Co., Ltd.. Active years: 1998-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teruaki Fukami. Retrieved from https://idiyas.com/inventor/teruaki-fukami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 60(Granted Patents)


Location History:

  • Nishishirakawa-gun, JP (2000)
  • Nishigo-mura, JP (2003)
  • Fukushima-ken, JP (1998 - 2005)

Company Filing History:

goldMedal10 out of 1,099 
 
Shin-Etsu Handotai Co., Ltd.
 patents

Years Active: 1998-2005

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10 patents (USPTO):Explore Patents
1. 6884721 - Silicon wafer storage water and silicon wafer storage method (2005-04-26),
2. 6582280 - Sandblasting agent, wafer treated with the same, and method of treatment with the same (2003-06-24),
3. 6306021 - Polishing pad, polishing method, and polishing machine for mirror-polishing semiconductor wafers (2001-10-23),
4. 6120353 - Polishing method for semiconductor wafer and polishing pad used therein (2000-09-18),
5. 612035 - Polishing method for semiconductor wafer and polishing pad used therein (2000-09-19),
6. 6060396 - Polishing agent used for polishing semiconductor silicon wafers and (2000-05-09),
7. 5891353 - Polishing agent used for polishing semiconductor wafers and polishing (1999-04-06),
8. 5866226 - Polishing agent used for polishing semiconductor wafers and polishing (1999-02-02),
9. 5821167 - Method of manufacturing semiconductor mirror wafers (1998-10-13),
10. 5792258 - High-frequency induction heater and method of producing semiconductor (1998-08-11),

Title: Teruaki Fukami: Innovator in Silicon Wafer Technology

Introduction

Teruaki Fukami is a prominent inventor based in Fukushima-ken, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of 10 patents. His work focuses on improving the storage methods and materials used for silicon wafers, which are critical components in the semiconductor industry.

Latest Patents

Fukami's latest patents include innovative methods for silicon wafer storage. One notable patent describes a storage water used for silicon wafers that contains copper (Cu) at a concentration of 0.01 parts per billion (ppb) or less. This method aims to prevent degradation of oxide dielectric breakdown voltage caused by Cu contamination. Another patent outlines a method where a wafer is stored in water or a chemical solution with the addition of a chelating agent, further enhancing the protection against contamination.

Career Highlights

Fukami is associated with Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor materials industry. His work has been instrumental in advancing the technology surrounding silicon wafers, ensuring their integrity during storage and handling. His innovative approaches have garnered attention and respect within the industry.

Collaborations

Fukami has collaborated with notable colleagues, including Hisashi Masumura and Kiyoshi Suzuki. Their combined expertise has contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Teruaki Fukami's contributions to silicon wafer technology highlight his role as a key innovator in the semiconductor industry. His patents and collaborative efforts continue to influence advancements in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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