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Fukushima-ken, Japan

Teruaki Fukami

USPTO Granted Patents = 10

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 59(Granted Patents)

Location History:

Nishishirakawa-gun, JP (2000)
Nishigo-mura, JP (2003)
Fukushima-ken, JP (1998 - 2005)

Company Filing History:

10 out of 1,099

Shin-etsu Handotai Co., Ltd.

Years Active: 1998-2005

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6884721 - Silicon wafer storage water and silicon wafer storage method (2005-04-26),

2. 6582280 - Sandblasting agent, wafer treated with the same, and method of treatment with the same (2003-06-24),

3. 6306021 - Polishing pad, polishing method, and polishing machine for mirror-polishing semiconductor wafers (2001-10-23),

4. 6120353 - Polishing method for semiconductor wafer and polishing pad used therein (2000-09-18),

5. 612035 - Polishing method for semiconductor wafer and polishing pad used therein (2000-09-19),

6. 6060396 - Polishing agent used for polishing semiconductor silicon wafers and (2000-05-09),

7. 5891353 - Polishing agent used for polishing semiconductor wafers and polishing (1999-04-06),

8. 5866226 - Polishing agent used for polishing semiconductor wafers and polishing (1999-02-02),

9. 5821167 - Method of manufacturing semiconductor mirror wafers (1998-10-13),

10. 5792258 - High-frequency induction heater and method of producing semiconductor (1998-08-11),

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