San Jose, CA, United States of America

Terry Leung


Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • San Jose, CA (US) (2005 - 2006)
  • Sunnyvale, CA (US) (2010)

Company Filing History:


Years Active: 2005-2010

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: The Innovative Mind of Terry Leung: A Glimpse into His Patents and Collaborations

Introduction

Terry Leung, an accomplished inventor based in San Jose, California, has made significant contributions to the field of integrated circuit fabrication. With a portfolio of three patents, Leung's work focuses primarily on advanced processing techniques that enhance the performance and reliability of semiconductor devices.

Latest Patents

Leung's latest patents reflect his innovative approach to solving complex problems in semiconductor manufacturing. The first patent, titled "Plasma for resist removal and facet control of underlying features," presents a substrate processing technique where a resist layer is applied over a dielectric feature. The method introduces a process gas, primarily composed of CO, into a substrate processing chamber, where plasma is formed through an antenna and process electrodes. This innovative technique allows for precise control over the edge facet height of dielectric features, enhancing the overall quality of the manufacturing process.

His second patent, "BARC shaping for improved fabrication of dual damascene integrated circuit features," addresses the challenges faced during the via-first dual damascene fabrication process. By introducing a bottom-antireflective-coating (BARC) that leads to the formation of a BARC plug, the patent minimizes the occurrence of 'fencing' material that typically hinders conformal coating. This improvement promotes cleaner dual damascene structures, ultimately leading to higher device yields.

Career Highlights

Throughout his career, Terry Leung has been associated with prominent companies such as Applied Materials, Inc., where he honed his expertise in semiconductor manufacturing technologies. His experience has equipped him with a profound understanding of the intricacies involved in the development of cutting-edge fabrication techniques.

Collaborations

Leung has collaborated with notable professionals in the field, including Chang-Lin Hsieh and Qiqun Zheng. These partnerships have facilitated the exchange of ideas and fostered an environment of innovation, contributing to the success of his inventions and the advancement of semiconductor technology.

Conclusion

Terry Leung's inventive spirit and dedication to advancing semiconductor fabrication processes underscore his valuable contributions to the industry. His latest patents not only showcase his technical prowess but also highlight the importance of collaboration in driving innovation. As the landscape of technology continues to evolve, Leung's work will undoubtedly pave the way for future advancements in integrated circuit manufacturing.

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