Bangkok, Thailand

Termsupt Seemuntchaiboworn

This inventor holds 2 USPTO granted patents. Top assignee: Fei Comapny. Active years: 2019-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Termsupt Seemuntchaiboworn. Retrieved from https://idiyas.com/inventor/termsupt-seemuntchaiboworn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: The Innovations of Termsupt Seemuntchaiboworn

Introduction

Termsupt Seemuntchaiboworn is a notable inventor based in Bangkok, Thailand. He has made significant contributions to the field of focused ion beam processing. With a total of 2 patents, his work has advanced the technology used in various applications.

Latest Patents

Termsupt's latest patents focus on endpointing for focused ion beam processing. This innovative method involves exposing a desired feature by milling thin slices from a cross section while forming a scanning electron image of each newly exposed section. The milling process is halted when an automatic analysis of the electron beam image indicates that a predetermined criterion has been met. This approach enhances precision and efficiency in the milling process.

Career Highlights

Termsupt Seemuntchaiboworn is currently employed at FEI Company, where he continues to develop and refine his innovative techniques. His work has garnered attention in the field, showcasing his expertise and commitment to advancing technology.

Collaborations

Some of Termsupt's coworkers include Scott Edward Fuller and Jason Donald. Their collaboration contributes to a dynamic work environment that fosters innovation and creativity.

Conclusion

Termsupt Seemuntchaiboworn's contributions to focused ion beam processing exemplify the impact of innovation in technology. His patents reflect a commitment to excellence and advancement in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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