The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Jan. 29, 2019
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Scott Edward Fuller, Portland, OR (US);
Jason Donald, Portland, OR (US);
Termsupt Seemuntchaiboworn, Bangkok, TH;
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/30 (2006.01); H01J 37/304 (2006.01); H01J 37/305 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/317 (2013.01); H01J 37/22 (2013.01); H01J 37/28 (2013.01); H01J 37/304 (2013.01); H01J 37/3005 (2013.01); H01J 37/3056 (2013.01); H01J 2237/08 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/2814 (2013.01); H01J 2237/30466 (2013.01); H01J 2237/31745 (2013.01); H01J 2237/31749 (2013.01);
Abstract
To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a predetermined criterion is met.