Tengfei Miao

Title: Innovations of Tengfei Miao in Semiconductor Manufacturing

Introduction

Tengfei Miao is a notable inventor based in Beaverton, Oregon, who has made significant contributions to the field of semiconductor manufacturing. With a total of three patents to his name, Miao's work focuses on enhancing processes and systems within this critical industry.

Latest Patents

Miao's latest patents include innovative methods and systems for dynamic process control in semiconductor manufacturing. These advancements provide for advanced monitoring and machine learning in atomic layer deposition (ALD) processes. His work also addresses dynamic process control and monitoring for chamber parameter matching and gas line charge times. Another significant patent involves the thermal atomic layer deposition of silicon-containing films. This method allows for the deposition of silicon oxide, silicon nitride, and silicon oxynitride films in a single wafer plasma reactor. The reactor can perform both thermal ALD and plasma-enhanced atomic layer deposition (PEALD). Miao's techniques enable the deposition of highly conformal films at high rates while minimizing damage to the substrate, with elevated temperatures ranging from 500°C to 750°C during the process.

Career Highlights

Tengfei Miao is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His expertise and innovative approaches have positioned him as a valuable asset in the field.

Collaborations

Miao collaborates with talented individuals such as Purushottam Kumar and Gengwei Jiang, contributing to a dynamic team focused on advancing semiconductor technologies.

Conclusion

Tengfei Miao's contributions to semiconductor manufacturing through his patents and work at Lam Research Corporation highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor processes.