The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Aug. 11, 2020
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Purushottam Kumar, Hillsboro, OR (US);
Tengfei Miao, San Jose, CA (US);
Gengwei Jiang, Tigard, OR (US);
Daniel Ho, Camas, WA (US);
Joseph R. Abel, West Linn, OR (US);
Siddappa Attur, Beaverton, OR (US);
Pulkit Agarwal, Beaverton, OR (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); G05B 19/41875 (2013.01); G05B 2219/32368 (2013.01);
Abstract
Methods and system are provided for dynamic process control in substrate processing, for example in semiconductor manufacturing applications. Some example systems and methods are provided for advanced monitoring and machine learning in atomic layer deposition (ALD) processes. Some examples also relate to dynamic process control and monitoring for chamber parameter matching and gas line charge times.