Beaverton, OR, United States of America

Siddappa Attur

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Lam Research Corporation. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Siddappa Attur: Innovator in Semiconductor Manufacturing

Introduction

Siddappa Attur is a notable inventor based in Beaverton, Oregon. He has made significant contributions to the field of semiconductor manufacturing, particularly in dynamic process control. His innovative work has led to advancements in substrate processing, which are crucial for the efficiency and effectiveness of semiconductor applications.

Latest Patents

Siddappa Attur holds 1 patent for his invention titled "Dynamic process control in semiconductor manufacturing." This patent encompasses methods and systems designed for dynamic process control in substrate processing. The invention includes advanced monitoring and machine learning techniques specifically for atomic layer deposition (ALD) processes. Additionally, it addresses dynamic process control and monitoring for chamber parameter matching and gas line charge times.

Career Highlights

Siddappa Attur is currently employed at Lam Research Corporation, a leading company in the semiconductor industry. His role involves leveraging his expertise to enhance manufacturing processes and improve product quality. His contributions have been instrumental in driving innovation within the company.

Collaborations

Siddappa has collaborated with talented coworkers such as Purushottam Kumar and Tengfei Miao. Together, they work on various projects that aim to push the boundaries of semiconductor technology.

Conclusion

Siddappa Attur's work in dynamic process control has made a significant impact on semiconductor manufacturing. His innovative approaches and collaborations continue to drive advancements in the industry.

Profile summary based on public USPTO records.
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