Gengwei Jiang

Title: Gengwei Jiang: Innovator in Semiconductor Manufacturing

Introduction

Gengwei Jiang is a prominent inventor based in Tigard, Oregon, known for his contributions to semiconductor manufacturing. With a total of two patents to his name, Jiang has made significant advancements in the field, particularly in dynamic process control and doping methods.

Latest Patents

Jiang's latest patents include a method for dynamic process control in semiconductor manufacturing. This patent outlines systems and methods for advanced monitoring and machine learning in atomic layer deposition (ALD) processes. It also addresses dynamic process control and monitoring for chamber parameter matching and gas line charge times. Another notable patent is a method for providing doped silicon using a diffusion barrier layer. This method involves forming a silicon oxide diffusion barrier layer on a substrate's surface, depositing at least one dopant layer over it, and then annealing the stack before removing the layers.

Career Highlights

Gengwei Jiang is currently employed at Lam Research Corporation, where he continues to innovate in semiconductor technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Jiang collaborates with talented coworkers, including Purushottam Kumar and Tengfei Miao, contributing to a dynamic team focused on advancing semiconductor technologies.

Conclusion

Gengwei Jiang's innovative work in semiconductor manufacturing showcases his expertise and commitment to advancing technology in this critical field. His patents reflect a deep understanding of process control and doping methods, making him a valuable asset to Lam Research Corporation and the industry as a whole.