Chang-Hwa Hsien, Taiwan

Teng-Feng Wang


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Chang-Hua Hsien, TW (2002)
  • Chang-Hwa Hsien, TW (2003)

Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Innovator Teng-Feng Wang: Advancements in Semiconductor Technology

Introduction: Teng-Feng Wang is a distinguished inventor based in Chang-Hwa Hsien, Taiwan. With a remarkable portfolio of two patents, he has made significant contributions to the field of semiconductor devices. His innovative approaches highlight the importance of precision in manufacturing processes, thereby enhancing device performance.

Latest Patents: Teng-Feng Wang's latest patents include a method for manufacturing a MOS device with improved well control stability and a novel process for device isolation. The first patent describes a comprehensive method which begins with the provision of a semiconductor substrate, the formation of a gate electrode consisting of a gate oxide layer and a conducting gate, and the inspection of the real dimensions of the conducting gate. By determining the appropriate thickness of subsequently formed conducting gate spacers, this method successfully reduces variations in the electric characteristics of the device due to critical dimensions.

His second patent reveals a process for device isolation, focusing on the creation of an isolation layer over the semiconductor substrate, which is then patterned into isolation mesas. Following this, a blanket semiconductor layer is applied to completely cover the isolation mesas. The subsequent planarization exposes the isolation mesas, leading to an active semiconductor region positioned between them, which is vital for operational semiconductor devices.

Career Highlights: Teng-Feng Wang is currently employed by Silicon Integrated Systems Corporation, where he is instrumental in researching and developing advanced semiconductor technologies. His work reflects a commitment to innovation and excellence in device manufacturing.

Collaborations: Throughout his career, Teng-Feng Wang has collaborated with notable colleagues, including Lung Chen and Zen-Long Yang. Their combined expertise fosters an environment conducive to groundbreaking advancements in semiconductor research.

Conclusion: Teng-Feng Wang stands out as a prominent inventor whose achievements have made a lasting impact on the semiconductor industry. His innovative methods not only enhance the capabilities of devices but also set a benchmark for future research and development in semiconductor technology.

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