Chiayi, Taiwan

Teng-Chun Yang

This inventor holds 1 USPTO granted patent. Top assignee: Promos Technologies, Inc. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teng-Chun Yang. Retrieved from https://idiyas.com/inventor/teng-chun-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations of Teng-Chun Yang

Introduction

Teng-Chun Yang is a notable inventor based in Chiayi, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the method of forming contact holes. His innovative approach has implications for the efficiency and effectiveness of electronic devices.

Latest Patents

Teng-Chun Yang holds a patent for a "Method of forming contact hole." This method involves several steps, including the conformal formation of a dielectric liner on a substrate, the removal of parts of the dielectric liner, and the formation of a conductive liner. The process culminates in the etching of an ILD layer to create multiple contact holes simultaneously. This patent showcases his expertise in enhancing semiconductor fabrication techniques.

Career Highlights

Yang is currently employed at Promos Technologies, Inc., where he continues to innovate in the semiconductor industry. His work focuses on improving manufacturing processes and developing new technologies that can lead to more efficient electronic components.

Collaborations

Teng-Chun Yang collaborates with talented individuals such as Hsin-Tang Peng and Yung-Ching Wang. These partnerships foster a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Teng-Chun Yang's contributions to the field of semiconductor technology are noteworthy. His innovative methods and collaborative spirit continue to drive advancements in the industry. His work exemplifies the importance of innovation in shaping the future of electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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