This inventor holds 3 USPTO granted patents. Top assignees: Intel Corporation, Lam Research Corporation. Active years: 1999-2003.
Company Filing History:
Years Active: 1999-2003
Title: Te Hua Lin: Innovator in Semiconductor Fabrication
Introduction
Te Hua Lin is a notable inventor based in Los Gatos, CA, who has made significant contributions to the field of semiconductor fabrication. With a total of 3 patents to his name, Lin has developed innovative methods that enhance the performance and efficiency of semiconductor structures.
Latest Patents
Among his latest patents, Lin has focused on methods for fabricating interconnect structures with Low K dielectric properties. One of his notable inventions involves a copper dual damascene structure fabricated in a LowK dielectric insulator. This process includes forming a capping film over the insulator before defining features within it. After the copper is formed in the features, the copper overburden is removed using ultra-gentle chemical mechanical polishing (CMP), followed by the removal of the barrier using a dry etch process. A second etch is then performed to thin the capping film, effectively reducing the thickness without complete removal, which in turn lowers the K-value of the LowK dielectric structure. Additionally, Lin has developed contact and via fabrication technologies that involve forming a contact opening between two conductive features over a semiconductor substrate, utilizing oxide spacers and a doped oxide layer.
Career Highlights
Throughout his career, Te Hua Lin has worked with prominent companies in the semiconductor industry, including Intel Corporation and Lam Research Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Lin has collaborated with several talented individuals in his field, including Mansour Moinpour and Farhad K Moghadam. These collaborations have further enriched his work and led to innovative solutions in semiconductor fabrication.
Conclusion
Te Hua Lin's contributions to semiconductor fabrication through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor technology.