Nagahama, Japan

Tatsuyuki Aoike

This inventor holds 42 USPTO granted patents, plus 1 CIPO patent, primarily in Plasma Processing. Top assignee: Canon Kabushiki Kaisha. Active years: 1989-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuyuki Aoike. Retrieved from https://idiyas.com/inventor/tatsuyuki-aoike

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 88.1


Average Co-Inventor Count = 3.8

ph-index = 12

Forward Citations = 382(Granted Patents)


Location History:

  • Nagahama, JP (1989 - 1998)
  • Nara, JP (1995 - 2001)
  • Shizuoka-ken, JP (2002)
  • Mishima, JP (2002 - 2003)
  • Nara-ken, JP (2003)
  • Shizuoka, JP (2004 - 2009)

Company Filing History:


Years Active: 1989-2009

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Areas of Expertise:
Plasma Treatment
Electrophotographic
Deposited Film
Photovoltaic Device
Non-Monocrystalline
Silicon Semiconductor
Light Receiving Member
Solar Cell
Vacuum Processing
Photoelectrical Conversion
Pin Heterojunction
Silicon Carbide
42 patents (USPTO):Explore Patents

Title: Innovations in Plasma Treatment: The Contributions of Tatsuyuki Aoike

Introduction

Tatsuyuki Aoike, an esteemed inventor based in Nagahama, Japan, has made significant strides in the field of plasma treatment technology. With an impressive portfolio of 42 patents, Aoike has demonstrated a commitment to innovation that has greatly benefited industries reliant on surface treatment processes.

Latest Patents

Among his latest innovations, Aoike has developed a plasma treatment method and apparatus aimed at enhancing the efficiency and cost-effectiveness of substrate surface treatment. This invention utilizes glow discharge generated by high-frequency power supplied into an evacuated reactor. His apparatus features multiple impedance regulation means tailored to the unique impedances of various reactors. This innovative design allows for efficient plasma treatment across multiple reactors, making it a valuable contribution to the field.

Career Highlights

Aoike has been an integral part of Canon Kabushiki Kaisha, where he has applied his expertise to advance the company's technological capabilities. His work in plasma treatment not only highlights his inventive talent but also the importance of effective collaboration within the industry.

Collaborations

During his career, Aoike has collaborated with other notable inventors, including Toshimitsu Kariya and Masafumi Sano. Their combined efforts have led to significant technological advancements and the successful development of numerous patents that continue to shape the future of plasma treatment technology.

Conclusion

Tatsuyuki Aoike stands out as a prominent inventor with a proven track record of innovation in plasma treatment. His commitment to enhancing efficiency and reducing costs in this field has cemented his reputation as a leading figure in the industry. As his work continues to influence technological advancements, Aoike’s contributions will undoubtedly have lasting effects on surface treatment processes around the world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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