The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Mar. 26, 2008
Toshiyasu Shirasuna, Shizuoka, JP;
Tatsuyuki Aoike, Shizuoka, JP;
Kazuyoshi Akiyama, Shizuoka, JP;
Hitoshi Murayama, Shizuoka, JP;
Takashi Otsuka, Shizuoka, JP;
Daisuke Tazawa, Shizuoka, JP;
Kazuto Hosoi, Shizuoka, JP;
Yukihiro Abe, Shizuoka, JP;
Toshiyasu Shirasuna, Shizuoka, JP;
Tatsuyuki Aoike, Shizuoka, JP;
Kazuyoshi Akiyama, Shizuoka, JP;
Hitoshi Murayama, Shizuoka, JP;
Takashi Otsuka, Shizuoka, JP;
Daisuke Tazawa, Shizuoka, JP;
Kazuto Hosoi, Shizuoka, JP;
Yukihiro Abe, Shizuoka, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means, a plurality of impedance regulation means for regulating impedances on the side of the reactor and on the side of the high-frequency power supply means are provided correspondingly to the impedances of a plurality of reactors, and the high-frequency power is supplied into the reactors via the impedance regulation means corresponding to the reactors. Plasma treatment can be made in a good efficiency and a low cost on a plurality of reactors having different impedances.