Koshi City, Japan

Tatsuya Tokumaru

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuya Tokumaru. Retrieved from https://idiyas.com/inventor/tatsuya-tokumaru

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tatsuya Tokumaru and Substrate Inspection Innovation.

Introduction

Tatsuya Tokumaru is an inventor based in Koshi City, Japan, and works at Tokyo Electron Limited. His work includes a patented method for identifying abnormalities on substrate surfaces using neural-network image analysis.

Latest Patents

Tokumaru is associated with 1 patent: “Substrate Inspection Method, Recording Medium, and Substrate Inspection Device.” The invention compares feature images derived from a reference substrate and an inspection target substrate. A neural network processes captured surface images, and information from an intermediate layer is used to generate the feature images. The system then compares those images to determine whether the target substrate has a surface abnormality.

Career Highlights

Tokumaru’s patent describes an approach to substrate inspection that applies neural-network analysis to surface images. By comparing learned image features rather than relying only on direct image comparison, the method provides a framework for detecting abnormalities in inspection targets.

Collaborations

Tokumaru’s listed coworker is Tadashi Nishiyama. Both are associated with Tokyo Electron Limited.

Conclusion

Tatsuya Tokumaru’s patented substrate-inspection method combines neural-network feature analysis with image comparison to identify potential surface abnormalities.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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