Company Filing History:

4 out of 13,726

Applied Materials, Inc.

patents

Years Active: 1994-2000

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4 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6060397 - Gas chemistry for improved in-situ cleaning of residue for a CVD (2000-05-09),

2. 5591494 - Deposition of silicon nitrides by plasma-enhanced chemical vapor (1997-01-07),

3. 5508067 - Deposition of silicon nitride by plasma-enchanced chemical vapor (1996-04-16),

4. 5314845 - Two step process for forming void-free oxide layer over stepped surface (1994-05-24),

Title: The Innovative Journey of Tatsuya Sato

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Conclusion: Tatsuya Sato's relentless pursuit of innovation and his passion for pushing the boundaries of technology continue to inspire the next generation of inventors and engineers globally.

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