Koshi, Japan

Tatsuya Kitayama

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2014-2024

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3 patents (USPTO):Explore Patents

Title: Tatsuya Kitayama: Innovating Substrate Separation Technologies

Introduction

Tatsuya Kitayama is a prominent inventor based in Koshi, Japan, known for his groundbreaking contributions in substrate separation technologies. With three patents to his name, his works specifically focus on methods and systems that enhance the efficiency of substrate handling in various applications.

Latest Patents

Kitayama's latest patents include a novel separation method, a separating apparatus, and a separating system. His separation method is designed to hold a combined substrate while effectively separating a first substrate from it. This operation starts from the side surface of the combined substrate and involves bringing a fluid containing water into contact with that surface. Additionally, his joint apparatus features distinct regions for transferring and processing substrates. In this apparatus, various mechanisms such as transfer, position adjusting, and reversing ensure seamless and accurate substrate handling during the joining process.

Career Highlights

Tatsuya Kitayama's career is significantly marked by his tenure at Tokyo Electron Limited, a leading global supplier of semiconductor and flat panel display production equipment. His innovative approaches and the successful realization of his patents have enhanced the manufacturing processes within the semiconductor industry, contributing to improved efficiency and yield.

Collaborations

Throughout his career, Kitayama has collaborated with notable coworkers, including Takahiro Nishibayashi and Naoto Yoshitaka. Together, they have worked to advance technologies that address some of the industry's most pressing challenges in substrate processing.

Conclusion

Tatsuya Kitayama exemplifies the spirit of innovation through his significant contributions to substrate separation technologies. His patents not only demonstrate a deep understanding of engineering principles but also highlight his commitment to enhancing manufacturing efficiency in the semiconductor sector. As technology continues to evolve, Kitayama's inventions will likely play a crucial role in shaping the future of substrate handling and processing.

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