Osaka, Japan

Tatsuo Sugiyama


Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 324(Granted Patents)


Company Filing History:


Years Active: 1997-2006

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10 patents (USPTO):Explore Patents

Title: Innovations of Tatsuo Sugiyama

Introduction

Tatsuo Sugiyama is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work has been instrumental in advancing methods for measuring temperature and fabricating semiconductor devices.

Latest Patents

Among his latest patents are innovative methods that enhance semiconductor manufacturing processes. One notable patent is a method for measuring temperature during the annealing process of substrates. This method involves measuring the emissivity on the reverse face of a substrate while various films are formed on its top face. Another significant patent details a method of manufacturing a semiconductor device, which includes the formation of a thin oxide film on a source/drain diffusion layer before depositing a cobalt film. This approach ensures the creation of a CoSi layer with uniform thickness and sheet resistance, improving the overall quality of semiconductor devices.

Career Highlights

Throughout his career, Tatsuo Sugiyama has worked with notable companies such as Matsushita Electric Industrial Co., Ltd. and Matsushita Electronics Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor technology.

Collaborations

Tatsuo has collaborated with esteemed colleagues, including Noboru Nomura and Tokuhiko Tamaki. Their combined expertise has contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Tatsuo Sugiyama's contributions to the field of semiconductor technology are noteworthy. His innovative patents and collaborations have significantly impacted the industry, showcasing his dedication to advancing technology.

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