This inventor holds 11 USPTO granted patents. Top assignees: Shin-Etsu Handotai Co., Ltd., Fujikoshi Machinery Corp., Other. Active years: 1994-2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Fukushima, JP (1994 - 1995)
- Nishigo-mura Nishi-shirakawa-gun, Fukushima-ken, JP (1995)
- Nishi-shirakawa-gun, JP (1998)
- Fukushima-ken, JP (1996 - 2001)
Company Filing History:
10 out of 1,099 
4 out of 71 
1 out of 834,513 Years Active: 1994-2001
Title: Tatsuo Ohtani: Innovator in Semiconductor Wafer Polishing
Introduction
Tatsuo Ohtani, hailing from Fukushima, Japan, is a renowned inventor known for his contributions to the semiconductor industry. With a total of 11 patents to his name, Ohtani has made significant advancements in the field of wafer polishing technology.
Latest Patents
Among his notable inventions is a Method and apparatus for wafer chamfer polishing. This innovation allows for the polishing of chamfers on semiconductor wafers, ensuring that once the wafer is grasped by a rotary suction cup of a transport robot arm, it will not be released until the polishing process is complete. The apparatus employs a circular turntable with six wafer suction cups, designed to rotate step-wise through 60 degrees for efficient wafer handling.
Another significant patent by Ohtani is the Apparatus for polishing the notch of a wafer. This device utilizes a flexible tape embedded with abrasive grains to effectively polish the notch of a wafer. This invention includes a feeding mechanism for the tape, a take-up reel, and a system for blowing fluid to ensure contact with the entire periphery of the notch, complemented by a means for oscillating the tape sideways to enhance the polishing efficiency.
Career Highlights
Throughout his career, Ohtani has been associated with esteemed companies such as Shin-Etsu Handotai Co., Ltd., a leader in silicon products, and Fujikoshi Machinery Corporation, known for its advanced manufacturing technologies. His work has played a crucial role in enhancing the efficiency and quality of semiconductor wafer processing.
Collaborations
Tatsuo Ohtani has collaborated with talented individuals in the field, including Fumihiko Hasegawa and Yasuyoshi Kuroda. Their collective expertise and innovative spirit have contributed to the development of groundbreaking technologies in wafer polishing.
Conclusion
Tatsuo Ohtani stands out as a pivotal figure in innovation within the semiconductor industry. His patents not only reflect his technical expertise but also his commitment to enhancing manufacturing processes. As the technology continues to evolve, Ohtani's contributions will undoubtedly influence future advancements in semiconductor wafer polishing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile