The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 1995

Filed:

Jun. 07, 1993
Applicant:
Inventors:

Fumihiko Hasegawa, Urawa-shi, Saitame-ken, JP;

Tatsuo Ohtani, Nishigo-mura Nishi-shirakawa-gun, Fukushima-ken, JP;

Yasuyoshi Kuroda, Nishigo-mura, Nishi-Shirakawa-gun, Fukushima-ken, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B / ; B25B / ;
U.S. Cl.
CPC ...
451180 ; 451401 ; 451 44 ; 451388 ;
Abstract

A wafer chamfer polishing apparatus with a rotary circular dividing table, wherein the vacuum pump for pneumatically activating the wafer suction cups is mounted on an integral part of the rotary circular dividing table and the drive motors for dynamically activating the wafer suction cups are installed on an independent stationary body.


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