Location History:
- Tokyo, JP (1981)
- Kawasaki, JP (2000 - 2004)
Company Filing History:
Years Active: 1981-2004
Title: Innovations of Tatsumi Shirasu in Semiconductor Technology
Introduction
Tatsumi Shirasu is a prominent inventor based in Kawasaki, Japan, known for his significant contributions to semiconductor technology. With a total of five patents to his name, Shirasu has made remarkable advancements in the manufacturing processes of semiconductor devices.
Latest Patents
His latest patents include a process for manufacturing a semiconductor wafer and a semiconductor integrated circuit device. The innovative process involves forming an epitaxial layer over a semiconductor substrate body that contains an impurity of a predetermined conduction type. This layer contains an impurity of the same conduction type and concentration as the designed one of the former impurity. Following this, a well region is formed with the same conduction type as the impurity, where the impurity concentration is gradually lowered depthwise of the epitaxial layer. This well region is crucial as it is formed with the gate insulating films of MIS-FETs, enhancing the performance of semiconductor devices.
Career Highlights
Throughout his career, Tatsumi Shirasu has worked with notable companies such as Hitachi, Ltd. and Renesas Technology Corporation. His experience in these leading firms has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.
Collaborations
Shirasu has collaborated with esteemed colleagues, including Hiroto Kawagoe and Shogo Kiyota. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the semiconductor field.
Conclusion
Tatsumi Shirasu's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents and collaborations reflect his commitment to enhancing the efficiency and effectiveness of semiconductor devices.