Koshi, Japan

Tatsuhiro Ueki


Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Koshi, JP (2019 - 2023)
  • Kumamoto, JP (2022 - 2023)

Company Filing History:


Years Active: 2019-2023

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4 patents (USPTO):Explore Patents

Title: Innovations of Tatsuhiro Ueki

Introduction

Tatsuhiro Ueki is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 4 patents to his name, Ueki's work focuses on enhancing the efficiency and precision of processing liquid ejection systems.

Latest Patents

Ueki's latest patents include a processing liquid ejection nozzle, a nozzle arm, a substrate processing apparatus, and a substrate processing method. The processing liquid ejection nozzle is designed to eject a processing liquid used for substrate processing. It features a nozzle main body that includes a first main body with a flow path communicating with a processing liquid supply path, and a second body bent from the first, forming a second flow path. The angle changing mechanism allows for adjustments in the nozzle's angle in relation to a fixed member. The substrate processing method focuses on controlling the discharge angle and position of the processing liquid supplied to the peripheral portion of a rotating wafer.

Career Highlights

Ueki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing technologies that improve substrate processing efficiency.

Collaborations

Some of Ueki's notable coworkers include Jian Zhang and Hiromitsu Nanba, who have collaborated with him on various projects within the company.

Conclusion

Tatsuhiro Ueki's innovative contributions to substrate processing technology highlight his expertise and commitment to advancing the field. His patents reflect a deep understanding of the complexities involved in processing liquid ejection systems.

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