The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2023
Filed:
Dec. 29, 2021
Tokyo Electron Limited, Tokyo, JP;
Tatsuhiro Ueki, Koshi, JP;
Jian Zhang, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatusis configured to supply a processing liquid to a peripheral portion of a wafer W being rotated. The substrate processing apparatusincludes a rotating/holding unitconfigured to rotate and hold the wafer W; a processing liquid discharging unitconfigured to discharge the processing liquid toward the peripheral portion of the wafer W held by the rotating/holding unita variation acquiring unit configured to acquire information upon a variation amount of a deformation of the peripheral portion of the wafer W; and a discharge controllerconfigured to control a discharge angle and a discharge position of the processing liquid from the processing liquid discharging unitonto the peripheral portion based on the information upon the variation amount of the deformation of the peripheral portion acquired by the variation acquiring unit.