Tat-Sing Chow

Title: The Innovations of Tat-Sing Chow

Introduction

Tat-Sing Chow is a notable inventor based in Niskayuna, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the fabrication processes of semiconductor structures, which are crucial for modern electronic devices.

Latest Patents

One of his latest patents is titled "Selective, electrochemical etching of a semiconductor." This patent describes methods for facilitating the fabrication of semiconductor structures. The process involves providing a multilayer structure that includes a semiconductor layer with increased conductivity due to a dopant. The method selectively increases the porosity of the semiconductor layer using electrochemical processing, which allows for the removal of parts of the semiconductor layer with enhanced porosity. Another significant patent is for a "Transistor," specifically an HEMT type transistor that is normally off. This invention features a p-type region, a barrier region, and an insulation film, ensuring minimal variations in the gate threshold voltage.

Career Highlights

Tat-Sing Chow has worked with prestigious organizations such as Rensselaer Polytechnic Institute and Toyota Motor Corporation. His experience in these institutions has allowed him to develop innovative technologies that advance the semiconductor industry.

Collaborations

Throughout his career, Chow has collaborated with notable colleagues, including Peter Almem Losee and Santhosh Balachandran. These partnerships have contributed to the successful development of his patents and innovations.

Conclusion

Tat-Sing Chow's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in electronic devices and semiconductor fabrication processes.